Abstract
Wide-angle far-field line generation using a simple optical system consisting of a cylindrical lens and a resonance-domain diffractive beam-shaping element is proposed. The desired intensity distribution is realized as a local average of the coherent superposition of the component fields in different diffraction orders of a multiple-beam-splitter grating with nanoscale transverse features. Fabrication tolerances of the proposed method are investigated and the system is demonstrated experimentally using electron beam lithography and reactive ion etching.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
