Abstract

In this paper, the preparation of amorphous silicon carbide with very wide optical band gap and high conductivity were reported. The films were fabricated under the “silane–plasma starving” and H 2 dilution condition in conventional capacitively coupled reactors. The silane–plasma starving condition and H 2 dilution play important roles in decreasing H content, modulating the material toward the ordered structure and enhancing the doping ratio. This is an easy way to prepare wide optical band gap and highly conductive p-type window layers for a-Si : H-based solar cells.

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