Abstract
The wetting behaviour of Si3N4 by alkaline-doped MgSiO3 was investigated by the sessile drop method. It is shown that the alkaline oxide additions improve the wetting of MgSiO3 on Si3N4. The hot-pressing of Si3N4 is controlled by a liquid phase sintering process where the dissolution of Si3N4 in silicate glass promotes good wetting and a well bonded interface by lowering the liquid-solid interfacial energy. Controlling total alkaline impurity level between 50 and 100 ppm is suggested for an optimal strength performance.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
