Abstract
In this study, we made an attempt to measure the wettability of the TiAlN films by molten Al at temperatures between 1073 K and 1273 K using an improved sessile drop method. The true contact angles cannot be obtained for the films deposited on the stainless steel and tungsten substrates due to considerable interdiffusion or reaction between molten Al and the substrate constituents. For the films deposited on the stable alumina single crystals and in contact with clean Al, the true contact angles are possible in the range of 80–100° at 1173–1273 K and the work of adhesion is 0.77–1.08 J m−2. In the case of oxidized Al, typically at T<1173 K, however, the wettability and the adhesion are significantly decreased.
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