濕式清洗台(Wet Bench)消防安全監控系統之風險評估-以某半導體廠為例

Abstract

In semiconductor processes, the wet bench uses the most organic solvents. During the process, the wafer is dried by heating at high temperature until evaporation occurs which leads to the potential risk of fire and explosion. Among all organic solvents, isopropyl alcohol has the lowest minimum ignition energy of 0.65 mJ, which is so low that even a spark of static electricity could ignite it leading to fire and explosion hazard. Numerous records and documents have pointed out the potential risk of company property and personnel safety if the safety device of the relevant production line is inadequate. When using the flammable organic solvent bench, fire extinguishing equipment is necessary because of the potential fire hazard. With the advances of semiconductor processes and the improvement of equipments, potential risks also evolve. The accompanied improvement and upgrade of the extinguishing system to an intelligent safety surveillance system includes such functions as graphical control, a back-up assistance system and responsible management organization etc. Although these functions decrease the probability of risks, the issues of incompetent technicians, unfamiliar operation and the troubleshooting of the equipment still require improvement. This research focuses on the safety surveillance system of the wet bench in a semiconductor factory and studies its failure module and FMEA (Failure Modes and Effects Analysis). The failure frequency of the equipment components and human negligence are discussed in order to control the encountered disaster or malfunction effectively and reduce the frequency of fire hazard and production interruption in the wet bench. It is hoped this will help the sustainable operation of the company.