Abstract
Well-ordered arrangements of Ag nanoparticles have been found for Ag-implanted SiO2 at depths corresponding to the projected range and end of range of Ag ions. Thermally grown SiO2 films of 300nm thick on Si were implanted with 350keV-Ag ions to fluences of 0.37–1.2×1017ions/cm2 at a current density about 4μA/cm2. Cross-sectional transmission electron microscopy and scanning transmission electron microscopy reveal the presence of a two-dimensional array of Ag nanoparticles of 25–40nm in diameter located at a depth of ∼130nm, together with the self-organization of δ-layer of tiny Ag nanoparticles aligned along the SiO2/Si interface. X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) confirm the stability of these Ag nanoparticles against oxidation and sulfidation when stored in ambient air for 19–21 months.
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