Well Number Dependence of Internal Quantum Efficiency in AlGaN Quantum Wells on Low‐Dislocation Sputtered AlN Templates

Abstract

The internal quantum efficiency (IQE) and cathodoluminescence intensity line profile of AlGaN multiple quantum well (MQW) structures on low‐dislocation face‐to‐face annealed sputtered AlN (FFA Sp‐AlN) and on conventional metalorganic vapor‐phase epitaxy‐grown AlN (MOVPE‐AlN) templates are evaluated and the effect of the number of quantum wells (QWs) on the IQE is discussed. The higher IQE in the FFA samples is probably due to the lower threading dislocation (TD) density; however, the IQE also increases with the number of QWs although the TD density remains constant. Effective diffusion length increases with the number of QWs, indicating that the AlGaN MQW layer helps to suppress point defect diffusion, resulting in IQE increase. Furthermore, the segregation of point defects into the TDs and point defect diffusion via the TDs may explain the difference in the IQE improvement rate between the MQWs on the FFA Sp‐AlN and MOVPE‐AlN templates.