Abstract

Self-assembled InAs∕InAlGaAs quantum dots (QDs) in an InAlGaAs matrix on InP (001) substrates were grown by the alternate growth method (AGQD), where an InAs layer with a thickness of 1 monolayer (ML) and an InAlGaAs layer with a thickness of 1 ML were alternately deposited. Cross-sectional transmission electron microscopy images indicated that the aspect ratio (height/width) for the AGQDs was ∼0.25, which was higher than ∼0.10 of conventionally grown InAs QDs. The photoluminescence (PL) peak position for the ground states of the AGQDs was 1.485μm with a linewidth broadening of 42meV at room temperature, while the PL linewidth for the conventionally grown QDs was 85meV. And the peaks for the excited-state transitions were also clearly observed from the excitation-power dependent PL. This is the first observation on the well-defined excited-state transitions from the InP-based InAs QDs, even though there were several reports on the features of the excited states.

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