Abstract

Growth of metallic nano-clusters and control over their size are critically important for catalysis. Development of film patterning procedures at the nanometer scale has significant impact on future lithography. In this work, we present an approach to grow metallic nano-clusters and control their size using a weakly bound buffer layer as an intermediate substance and a template to control the clusters size at the range 1–15 nm. The buffer layer was further employed to create a pattern based on a selective laser ablation procedure. A thicker metallic film deposited on top of pre-patterned buffer layer has been demonstrated as a novel patterning technique at the sub-micron to nanometer scale employing a single laser pulse. The thermal stability of metallic structures prepared this way has been studied at temperature up to 1000 K.

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