Abstract
This paper investigates the feasibility of using weak link nanobridges as Josephson junction elements for the purpose of creating Josephson circuits. We demonstrate the development of a single-step electron beam lithography procedure to fabricate niobium nanobridges with dimensions down to . The single-step process facilitates fabrication that is scalable to complex circuits that require many junctions. We measure the IV-characteristics (IVC) of the nanobridges between temperatures of and and find agreement with numerical simulations and the analytical resistively shunted junction (RSJ) model. Furthermore, we investigate the behaviour of the nanobridges under rf irradiation and observe the characteristic microwave-induced Shapiro steps. Our simulated IVC under rf irradiation using both the RSJ model and circuit simulator JSIM are in agreement with the experimental data. As a potential use of nanobridges in circuits requiring many junctions, we investigate the theoretical performance of a nanobridge-based Josephson comparator circuit using JSIM.
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