Abstract

Optical isolators and circulators are important components for photonic integrated circuits. Despite significant progress on silicon-on-insulator (SOI) platforms, integrated optical isolators and circulators have rarely been reported on silicon nitride (SiN) platforms. In this paper, we report monolithic integration of magneto-optical (MO) isolators on SiN platforms with record-high performances based on standard silicon photonics foundry process and MO thin film deposition. We successfully grow high-quality MO garnet thin films on SiN with large Faraday rotation up to - − 5900 d e g / c m . We show superior MO figure of merit (FoM) of MO/SiN waveguides compared to that of MO/SOI in an optimized device design. We demonstrate transverse magnetic (TM)/transverse electric (TE) mode broadband and narrowband optical isolators and circulators on SiN with high isolation ratio, low cross talk, and low insertion loss. In particular, we observe 1 dB insertion loss and 28 dB isolation ratio in a SiN racetrack resonator-based isolator at 1570.3 nm wavelength. The low thermo-optic coefficient of SiN also ensures excellent temperature stability of the device. Our work paves the way for integration of high-performance nonreciprocal photonic devices on SiN platforms.

Highlights

  • Optical isolators and circulators are key components in photonic integrated circuits (PICs).They prevent the reflected light from adversely affecting the lasers and the optical system [1]

  • High performance, monolithically integrated optical isolators and circulators for both TE and TM polarizations on silicon nitride (SiN) have been experimentally demonstrated in this report

  • Ce1.4Y1.6Fe5O12 thin films are deposited on SiN with high Faraday rotation up to -5900°/cm at 1550 nm

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Summary

Introduction

Optical isolators and circulators are key components in photonic integrated circuits (PICs). For MO isolators based on the nonreciprocal-phase shift (NRPS) effect, the low refractive index of SiN leads to much lower NRPS compared to SOI waveguides [28], placing significant challenges for fabricating a high performance MO optical isolator device on SiN. The much higher insertion loss of these devices compared to their counterparts on SOI was due to the relatively low magneto-optical effects of the Ce:YIG thin film, as well as the non-ideal device geometry It is still uncertain whether a high-performance optical isolator can be integrated on SiN. SiN isolators maintained a relatively stable operation wavelength within the temperature range from 20 °C to 70 °C, showing a small wavelength drift within 4 nm This value is smaller compared to a drift over 6 nm for SOI devices from 20 °C to 60 °C [46], due to the larger thermo-optic coefficient of Si (1.8×10-4/K) [48].

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