Abstract
We apply a phase retrieval algorithm to the intensity patterns acquired from a Hartmann–Shack wave-front sensor to measure the wave-front aberration of a deep ultraviolet lithography system. The intensity patterns are obtained with and without the micro-lens array. Thus, we avoid selecting algorithm-specific parameters such as step-size and trust-region. Simulation results show that the phase-retrieval method enhances the accuracy of wave-front reconstruction compared with the conventional wave-front slope method. The relationships between the number of iterations of the phase retrieval algorithm, the calculating time and the wave-front reconstruction error are studied. This study demonstrates that the phase-retrieval method provides more accurate estimates of aberrations in near-flat wave-fronts relative to the wave-front slope method.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
