Wavefront measurements using the Ronchi test for high-NA lithography projection lenses.

Abstract

The Ronchi test is widely used for wavefront measurements in advanced lithography tools, and a physical optics explanation of the Ronchi test based on scalar diffraction theory can be found in numerous publications. However, for high-numerical aperture (high-NA) lithography projection lenses, the vector nature of light should be considered when performing wavefront measurements, especially the effect of polarization aberrations on the wavefront test results. In this paper, a vector model for describing shearing interferometry for high-NA lithography projection lenses is established. In addition to considering the vector nature of light, the vector model also calculates the Ronchigram on the screen of a detector at any distance from a diffraction grating, as opposed to the distance restriction for the Fraunhofer diffraction approximation used by the existing methods. Using the developed mathematical model of the Ronchi test, the Ronchigrams of high-NA lithography projection lenses under non-polarized illumination are simulated, and the effect of the distance between the diffraction grating and the detection screen on the wavefront measurement accuracy are discussed.