Abstract
A highly precise adaptive optical system that can be used in the hard X-ray region was developed. To achieve highly precise control of the wavefront shape, we discussed an optical system with a bendable mirror of deformation accuracy better than 0.4 nm RMS. Using the system, we demonstrated the controllability of the wavefront of a 15 nm hard X-ray nanobeam. The intensity profile of the wavefront-modified beam was in good agreement with the wave-optically calculated profile.
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