Abstract
We propose two types of wavefront aberration correction in geometric-phase lenses (GPLs). First, in situations in which the incident light on a GPL has a wavefront aberration represented by the Zernike polynomial, the wavefront aberration is eliminated by setting a phase distribution that cancels the phase distribution of the incident light to GPL. Second, the aberration that occurs when a light wave is obliquely incident on the GPL is compensated for by a correction method that incorporates an optimization design using a genetic algorithm. These methods have been demonstrated not only by theory but also by experiments using imaging systems in which the designed and fabricated GPLs are utilized. These wavefront aberration correction methods can be expected to overcome wavefront aberration caused by the arrangement of optical elements in an optical system and contribute to expanding the application range of GPLs.
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