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Open Accesshttps://doi.org/10.1016/j.mne.2023.100202
Copy DOI Journal: Micro and Nano Engineering |  Publication Date: Jun 1, 2023 |
 Citations: 1 |  License type: cc-by-nc-nd |
Affiliation: Atomic Energy and Alternative Energies Commission, Institut de Sciences des Matériaux de Mulhouse, Institut des Nanotechnologies de Lyon, Laboratory of Polymer Materials Engineering, University of Reims Champagne-Ardenne, Centre Hospitalier Universitaire de Reims, Institute of Analytical Sciences, Nanophoton (Brazil)Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment
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