Abstract
At ultrahigh vacuum (UHV), clean and Al doped SiO2 films were epitaxially grown on Mo(112). The pristine films are often denoted as silicatene, whereas the doping should result in two-dimensional zeolitelike films. The films were prepared by vapor deposition of Al on silicatene, followed by postannealing in UHV. The films were characterized by Auger electron spectroscopy and thermal desorption spectroscopy (TDS). Whereas the first synthesis of these films was reported earlier [Stacchiola et al., Angew. Chem. Int. Ed. Engl. 45, 7636 (2006); Gründling et al., Surf. Sci. 318, 97 (1994)], we discuss another variation of the film preparation. Moreover, water adsorption kinetics was studied by TDS. Accordingly, Al doped silica exhibits hydrophilic characteristics compared to hydrophobic silicatene, which reflects the enhanced chemical reactivity due to the doping induced polarity of the zeolite film.
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