Abstract
Wafer-scale, nanoimprint lithography-based approaches for manufacturing of high-efficiency transmission gratings at telecom wavelengths are reported. Two microns-deep, binary gratings are thereby fabricated and combined with a subwavelength, antireflective structure to achieve a cost-efficient and reliable manufacturing process. Diffraction efficiencies of 92% are experimentally achieved in the Littrow configuration. These gratings are used to compress 8 picosecond pulses with 1W of average output power at central wavelength of 1555nm to pulse duration of 378 femtoseconds
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