Abstract
We demonstrated a simple method for achieving green and red colors by patterning quantum dots (QDs) on GaN-based blue micro-light-emitting diodes (μLEDs) using standard photolithography and dry etching process. The QDs could be patterned as small as 2 μm in size on a 4-inch wafer, revealing the ultra-high resolution and throughput capability of this method. The individual color-converted green and red μLEDs in a size of 10 μm × 10 μm exhibited a peak external quantum efficiency (EQE) of 9.6% and 14.7%, respectively. We also achieved the monolithic integration of red, green, and blue (RGB) μLEDs as a single pixel by sequentially patterning red and green QDs. The color gamut of the RGB μLEDs covered 83.4% of the Rec. 2020 color space in the CIE 1931 diagram. This method is very effective for patterning color-converted QDs with down to 2μm-size-resolution and achieving high performance for red/green μLEDs, while enabling scalable fabrication of full-color μLED displays.
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