Abstract
Large-scale fabrication of targets for laser-driven acceleration of ion beams is a prerequisite to establish suitable applications, and to keep up with the challenge of increasing repetition rate of currently available high-power lasers. Here we present manufacturing and test results of large arrays of solid targets for TNSA laser-driven ion acceleration. By applying micro-electro-mechanical-system (MEMS) based methods allowing for parallel processing of thousands of targets on a single Si wafer, sub-micrometric, thin-layer metallic membranes were fabricated by combining photolithography, physical and chemical vapor deposition, selective etching, and Si micromachining. These structures were characterized by using optical and atomic force microscopy. Their performance for the production of laser-driven proton beams was tested on a purpose-made table-top Ti:Sapphire laser system running at 3 TW peak power with a contrast over ASE of 108. We have performed several test series achieving maximum proton energy values around 2 MeV.
Highlights
In the years a series of high power laser installations will be available worldwide with the ability of operating at repetition rates (1÷10 Hz) never before experienced
By applying micro-electro-mechanical-system (MEMS) based methods allowing for parallel processing of thousands of targets on a single Si wafer, sub-micrometric, thin-layer metallic membranes were fabricated by combining photolithography, physical and chemical vapor deposition, selective etching, and Si micromachining
We have presented the fabrication of submicrometric, conductive, thin-layer membranes embedded in a Si wafer according to a MEMS based manufacturing approach
Summary
In the years a series of high power laser installations will be available worldwide with the ability of operating at repetition rates (1÷10 Hz) never before experienced. By applying micro-electro-mechanical-system (MEMS) based methods allowing for parallel processing of thousands of targets on a single Si wafer, sub-micrometric, thin-layer metallic membranes were fabricated by combining photolithography, physical and chemical vapor deposition, selective etching, and Si micromachining.
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