Abstract
We measure the current-induced voltage noise in various fields H to study the vortex states of a thick amorphous MoxSi1−x film. We focus on the field region between the Meissner phase and the vortex-glass (VG) phase, where vortex states have not yet been clarified. Noise SV is largest in the Meissner phase (H<Hc1). With increasing H(>Hc1), SV falls near or below the background level. With further increasing H, SV starts to rise at certain field H0, taking a broad peak in the VG phase, and falls again below the background level at a VG-to-liquid transition Hg. We interpret H0 as a characteristic field around which VG order starts to form. We find that in the temperature range studied the field region (Hc1<H<H0) grows monotonically upon cooling.
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