Abstract

A new algorithm to build blue noise masks using centroidal Voronoi tessellations (CVT) and a variant of Lloyd's Algorithm is presented. The algorithm takes advantage of the optimality properties of CVTs and through a modified version of Lloyd's algorithm, achieves optimization of the stacked binary patterns that build the mask. A new ordering for binary pattern design is presented, as well as a new metric that allows the creation of quality profiles of the masks. The masks generated by this method are used to halftone sample images, and quality profiles are created. It is shown that CVT masks outperform masks created by DBS and VaC according to the new metric defined and thorough visual inspection of halftoned images.

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