Voltammetric characterization of gold, metallized-plastic electrodes, following exposure to ion beams or RF plasmas

Abstract

Voltammetric analysis for the formation and reduction of gold oxide was used to probe surface compositional changes caused by argon-ion beams or oxygen RF plasmas. Gold, metallized plastic film electrodes were explored because of their reproducible surface composition and electrochemical characteristics, and because of our interest in exploiting the carbonaceous composition of their surface. Low doses of ions (<5 × 10 15/cm 2) caused a physical and chemical activation of the gold film surface. Higher ion doses caused degradation of the conductive film which could be monitored electrochemically. Oxygen RF plasmas caused the formation of a voltammetrically quantitable gold oxide—in a fashion not seen for bulk gold or other gold films.