Abstract
Preliminary investigations of a balanced magnetron system demonstrated the possibility of metallic Ti and Ti-6Al-4V film deposition onto glass substrate. In order to deposit the coatings in reactive mode the additional permanent magnets were mounted in the vacuum chamber and the system for reactive gases flow had been installed. The magnetic field configuration in the deposition volume was measured by the Hall probe and various voltage-current characteristic of the magnetron discharge were also presented. The axial and radial distribution of the maximum ion current density was measured by the Langmuir electrostatic probe. It has been shown that the current density of the substrate bombarding ions may be far in excess of 1 mA/cm 2 .
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