Abstract
An overview is given of exploratory Metal-Insulator Transition material based nanoelectronics research at imec and UGent. The VO2 thin film growth techniques used are elaborated. This considers thermal oxidation of vanadium metal and Atomic Layer Deposition (ALD). Fundamental device properties such as voltage driven switching and tunnel junction properties are discussed. Device concepts making use of MIT materials or VO2 are elaborated.
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