Abstract

In this work the contour visualization method of developed high aspect ratio microstructures with any lateral size of ∼1 μm in thick PMMA layers using normal and tilted SR exposure is proposed in order to investigate the microstructures behaviour and the development process. This method can be also applied in situ during the development process.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call