Abstract

To investigate the resist filling behavior in micro/nanolithography,a three-dimensional(3D)defocusing digital particle image velocimetry(DDPIV)technique was adopted to record the defocused images of the fluorescent tracer particles dispersed in a resist film.A three-dimensional particle tracking velocimetry(3D-PTV)algorithm based on two-frame defocused images was proposed aiming at the particularity of the defocused images of tracer particles.The tracing of the 3D motion trajectories of the particles was realized,and the three-dimensional velocity fields of the particles were constructed.A numerical model based on the computational fluid dynamics(CFD)was built to predict the resist filling behavior,which justified the validity of the DDPIV technique for constructing the micro flow field in the resist filling process.

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