Abstract
Nanoparticles are visualized and identified in a near-surface Si layer subjected to the successive implantation of 64Zn+ and 16O+ ions. Scanning transmission electron microscopy coupled with energy-dispersive spectroscopy and X-ray photoelectron spectroscopy are used. An amorphized region 150 nm thick and a disturbed layer 50 nm thick in the near-surface layer of the substrate are revealed after implantation. Zinc oxide (ZnO) nanoparticles with an average size of 8.7 nm are found in the recrystallized polycrystalline silicon layer after annealing in a neutral-inert atmosphere at a temperature of 600–800°C.
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