Abstract
AbstractMetasurfaces enable precise control over the properties of light and hold promise for commercial applications. However, fabricating visible metasurfaces suitable for high‐volume production is challenging and requires scalable processes. Nanoimprint lithography is a cost‐effective and high‐throughput technique that can meet this scalability requirement. This work presents a mask‐templating nanoimprint lithography process for fabricating metasurfaces with varying fill factors and negligible wavefront aberrations using composite stamps. As a proof‐of‐concept, a 6 mm diameter metalens formed of silicon nitride nano‐posts with a numerical aperture of 0.2 that operates at 550 nm is demonstrated. The nanoimprinted metalens achieves a peak focusing efficiency of (81 ± 1)%, comparable to the control metalens made with electron beam lithography with a focusing efficiency of (89 ± 1)%. Spatially resolved deflection efficiency and wavefront data, which informs design and process optimization, is also presented. These results highlight nanoimprint lithography as a cost‐effective, scalable method for visible metasurface fabrication that has potential for widespread adoption in consumer electronics and imaging systems.
Published Version
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