Abstract

Graphitic carbon nitride (g-C3N4) as metal-free visible light photocatalyst has recently emerged as a promising candidate for water disinfection. Herein, a nanowire-rich superhydrophilic g-C3N4 film was prepared by a vapor-assisted confined deposition method. With a disinfection efficiency of over 99.99% in 4 h under visible light irradiation, this nanowire-rich g-C3N4 film was found to perform better than conventional g-C3N4 film. Control experiments showed that the disinfection performance of the g-C3N4 film reduced significantly after hydrophobic treatment. The potential disinfection mechanism was investigated through scavenger-quenching experiments, which indicate that H2O2 was the main active specie and played an important role in bacteria inactivation. Due to the metal-free composition and excellent performance, photocatalytic disinfection by nanowire-rich g-C3N4 film would be a promising and cost-effective way for safe drinking water production.

Highlights

  • The COVID-19 pandemic has demonstrated the critical importance of sanitation, hygiene and adequate access to clean water for preventing and containing diseases

  • Either melamine or urea was employed as precursor alone for synthesizing the g-C3N4 film and the optical images were shown in Supplementary Figure S2

  • Only few works report on the wettability of g-C3N4 film, which is an important parameter for water disinfection (Liang et al, 2015; Lin et al, 2019; Wu et al, 2019; Giusto et al, 2020c)

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Summary

Introduction

The COVID-19 pandemic has demonstrated the critical importance of sanitation, hygiene and adequate access to clean water for preventing and containing diseases. A simple vapor-assisted confined deposition method was performed to obtain the nanowire-rich and superhydrophilic g-C3N4 films as previously reported (Jia et al, 2019). In a typical synthesis of such nanowire-rich g-C3N4 film on the ground glass substrate, the mixture of urea and melamine was employed as precursor for thermal polycondensation in a vapor-assisted confined deposition setup.

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