Abstract
Positive-working photoresists based on poly(p-hydroxystyrene) (PHS), 2, 2-bis[4-(2- (vinyloxy)ethoxy)phenyl] propane (BPA-DEVE) has been investigated on their sensitivities to 488-nm argon ion laser using binary acid generated system. 2-(2′, 4′-dimethoxystyryl)- 4, 6-bis(trichloromethyl)-1, 3, 5-triazine (TAZ114), diphenyliodonium p-toluenesulfonate (DITS) and diphenyliodonium trifluoromethanesulfonate (DITFMS) were used as photoacid generator. Acridine orange, rose bengal, thioxanten-9-one and 3, 3′- carbonylbis(7, 7′-diethylaminocoumarin) (KCD) were used as sensitizing dye. In these photopolymers, the polymer containing of TAZ114 and acridine orange exhibits the highest sensitivity to 488-nm light at 147.5mJ/cm2.
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