Abstract
The photostabilization of poly(vinyl chloride) (PVC) films having five Schiff’s bases derived from sulphamethoxazole has been investigated. The casting method was used to produce PVC films containing sulphamethoxazoles (0.5% by weight), in tetrahydrofuran. The photostabilization activities of five additives were determined by monitoring the hydroxyl, polyene and carbonyl indices with irradiation time. In addition, the quantum yield of the chain scission (Φcs) and the changes in viscosity average molecular weight of PVC films containing Schiff’s basses were evaluated with irradiation time. The rate of photostabilization for PVC films in the presence of five Schiff’s base additives was found to be the highest in the case of 2-hydroxybenzylidene derivative and the lowest in the unsubstituted benzylidene derivative. Several mechanisms have been suggested to explain the photostabilization of PVC in the presence of Schiff’s bases that mainly act as UV absorbers and radical scavengers for photostabilizers.
Highlights
Photodegradation of polymeric materials take place when exposed to ultraviolet (UV) radiation
We report the successful use of Schiff’s bases derived from sulphamethoxazole as UV-stabilizers in the photostabilization of polyvinyl chloride (PVC)
The Fourier transform Infrared (FT-IR) spectra were recorded on FTIR-8300 Shimadzu Spectrophotometer (Shimadzu Cooperation, Kyoto, Japan) within the frequency range of 400–4000 cm1
Summary
Photodegradation of polymeric materials take place when exposed to ultraviolet (UV) radiation. Ultraviolet absorbers (UVAs) are chemicals that can absorb ultraviolet radiation and reduce their damaging effects. Such chemicals can act as ultraviolet stabilizers and can be added to various polymeric materials. Various ultraviolet light stabilizers are known and have been used in various interesting materials such as cosmetics, plastics and films [1]. Antioxidant materials are known as heat and light stabilizers that can be added to plastics to avoid its deterioration [1]. We have reported the use of various additives to increase photostabilizing efficiency and photochemical stability of polymeric materials [16,17,18,19] as part of our interest in the synthesis of polymeric materials with interesting applications [20,21,22]. We report the successful use of Schiff’s bases derived from sulphamethoxazole as UV-stabilizers in the photostabilization of polyvinyl chloride (PVC)
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