Abstract
Compared to conventional oven-based annealing in ambient air of a silicon surface layer nanotextured and hyperdoped in CS2 fluid by femtosecond laser (black nano-silicon), low-intensity nanosecond laser annealing facilitated its delicate recrystallization, preserving quasi-regular nanoscale topography and high n-doping concentration by sulfur donor impurities. The retained and recrystallized topography of the laser-annealed nano-silicon with a few-percent doping level exhibits broadband optical absorption in the visible−near-infrared (vis−NIR) range, rendering this optical material promising for photovoltaic and IR-photonic applications.
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