Abstract
Abstract The state-resolved vibrational relaxation process of SiO was monitored in the excimer laser photolysis of N2O/SiH4/He mixtures, where vibrationally hot SiO (Tv = 5200 K) was produced by the reaction of SiH4+ O(1D). A frequency-doubled optical parametric oscillator was used as a widely tunable source to probe SiO (v = 0—7) by the laser-induced fluorescence technique. From an analysis of the observed relaxation profiles, the vibrational transition rate constants in collisions with He and N2O were evaluated against the vibrational level v = 1—5 of SiO. Previous theories for the V-T and V-V energy transfer were compared with the present experimental results.
Published Version
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