Abstract
The reactive sputtering rate for the group IVb nitrides approaches the sputtering rate for the metal provided that there is precise control of the process parameters. For TiN the reactive sputtering rate is 100% of the metal rate whereas for ZrN and HfN the rate is 95% of the metal rate. Compared with chemical vapor deposition and other physical vapor deposition processes, reactive sputtering of these compounds is a low temperature process. The maximum recordable substrate temperature immediately after deposition was 315 °C. The hardness of the TiN and ZrN coatings is greater than the bulk value, and the adhesion of these coatings to M2 steel is excellent. Cutting tool tests showed that TiN coatings reactively sputtered at a high rate are very effective in enhancing tool life.
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