Abstract
The effects of frequency variation in a high-frequency (13.6-54.4 MHz), low-pressure (250 mTorr), capacitively coupled argon discharge have been investigated. Spatially resolved optical emission and RF voltage and current measurements are reported. Results of fluid model simulations are also presented to aid in the interpretation of the experiments. Scaling of plasma parameters is studied under three conditions: constant frequency, constant applied voltage and constant current. The scaling laws derived here suggest ways to optimize a very high-frequency plasma reactor for thin film etching and deposition applications.
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