Abstract
A low-temperature plasma enhanced chemical vapor deposition procedure is developed for hexagonaloro boron nitride nanowalls that are an array of sheets vertically aligned relative to the Si(100) substrate. A triethylaminoborane and ammonia gas phase was used for the first time to form h-BN nanowalls. Nanowall sizes are 50–250 nm long and 10–25 nm thick. Grazing incidence X-ray diffraction and high-resolution transmission electron microscopy techniques are employed to study the structures of boron nitridex nanowalls. The effect of synthesis parameters (film deposition temperature and growth time) on the chemical and phase compositions, surface morphology, film structure, and their optical properties are analyzed.
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