Vertical structure permeable-base hybrid transistors based on multilayered metal base for stable electrical characteristics

Abstract

In this work we present a permeable-base transistor consisting of a 60 nm thick N, N′-diphenyl- N, N′-bis(1-naphthylphenyl)-1,1′-biphenyl-4,4′-diamine layer or a 40 nm thick 2,6-diphenyl-indenofluorene layer as the emitter, a Ca/Al/Ca multilayer as the metal base, and p-Si as collector. In the base, the Ca layers are 5 nm thick and the Al layer was varied between 10 and 40 nm, the best results obtained with a 20 nm thick layer. The devices present common-base current gain with both organic layer and silicon acting as emitter, but there is only observable common-emitter current gain when the organic semiconductor acts as emitter. The obtained common-emitter current gain, ∼2, is independent on collector-emitter voltage, base current and organic emitter in a reasonable wide interval. Air exposure or annealing of the base is necessary to achieve these characteristics, indicating that an oxide layer is beneficial to proper device operation.