Abstract
Interferometry is an optical testing technique that quantifies the optical path difference (OPD) between a reference wave front and a test wave front based on the interference of light. Fringes are formed when the OPD is an integral multiple of the illuminating wavelength. The resultant two-dimensional pattern is called an interferogram. The function of any interferogram analysis program is to extract this OPD and to produce a representation of the test wave front (or surface). This is accomplished through a three-step process of sampling, ordering, and fitting. We develop a generalized linear-algebra vectornotation model of the interferogram sampling and fitting process.
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