Abstract
Preparation of aluminum oxide (Al2O3) films on different substrates by sol-gel method and hydrothermal reaction is significant for inorganic coatings preparation in packaging and coating area. Here, we prepare Al2O3 films by adjusting water content, and we provide evidences from SEM and TEM observations that the appearance of Al2O3 films on silicon (Si) substrates presents diverse forms, including disperse granular, globular particles, rectangular pyramid and nanowire. From XRD, Water Contact Angle (WCA) and XPS experiment results, the wettability of Al2O3 films can be controlled by water content in hydrothermal reaction, in which 10 ml is hydrophobic and 20 ml hydrophilic. Meanwhile, the Al2O3 film provide a good substrate for electroless deposition (ELD) of copper (Cu) to achieve a simple fabrication of metal conductor, and conductivity of 10 ml sample is the largest.
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