Abstract
We present a varifocal scanning micromirror fabricated from a silicon-on-insulator wafer. The varifocal scanning micromirror consists of a varifocal mirror with a rotational scanning function. The scanner and varifocal mirror are driven by comb and parallel-plate electrostatic actuators, respectively. The mirror rotates 5.5° at 45 V in static mode. The curvature of the varifocal mirror is changed from -4 m <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-1</sup> (-128-mm focal length) to +5 m <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-1</sup> (+93-mm focal length) by applying a voltage from 0 to 50 V. It is confirmed that the lateral position and spot size of the reflected laser beam from the varifocal scanning micromirror are changed simultaneously. Moreover, confocal sensing is demonstrated using a fiber-optic system with the proposed mirror.
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