Abstract
Reactive plasmas generated by discharge decomposition of various molecular gases have been used in many fields of industry for thin film electronic devices, new material, gas laser and so on.This paper reviews (i) what aspects of a reactive plasma are distinctive in comparison with other plasmas, (ii) what parameters of the plasma are needed to be controlled for industrial applications, (iii) how deeply the reactive plasma has been understood in view of basic physics and chemistry, and (iv) what innovative techniques of plasma production and control have been developed.
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