Variation of the electron inelastic mean free path during depth profiling of the Fe/Si interface as determined by quantitative REELS

Abstract

AbstractThe aim of this work is to determine the dependence of the electron inelastic mean free path (IMFP) at the Fe/Si interface during depth profiling by sputtering with 3 keV Ar+ ions. In order to estimate the variation of the IMFP at the interface, reflection electron energy‐loss spectroscopy (REELS) measurements were performed after different sputtering times at the Fe/Si interface with three different primary electron energies (i.e. 0.5, 1 and 1.5 keV). Even though it is highly likely that a compound (i.e. FexSi) is formed at the interface, all the experimental REELS spectra could be analysed as a linear combination of those corresponding to pure Si and Fe. Using the model developed by Yubero and Tougaard for quantitative analysis of these REELS spectra we could estimate the IMFP values along the depth profile at the interface. The resulting IMFPs are observed to vary linearly with the average composition (as determined by REELS) at the Fe/Si interface as it is sputter depth profiled. The energy dependence of the IMFP for different compositions is presented and discussed. For completeness, we have determined the energy‐loss functions as well as the IMFPs of the pure elements (i.e. Fe and Si). Copyright © 2004 John Wiley & Sons, Ltd.