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Abstract
A theoretical approach for including considerable thickness non-uniformity of thin filmsinto the formulae employed within variable-angle spectroscopic ellipsometry is presented. Itis based on a combination of the efficient formulae derived for the thickness distributiondensity corresponding to a wedge-shaped non-uniformity with dependences of the meanthickness and root mean square (rms) of thickness differences on the angle of incidence thattake into account the real non-uniformity of the shape. These dependences are derivedusing momentum expansion of the thickness distribution density. The derived formulaeare tested by means of numerical analysis. An application of this approach isillustrated using the optical characterization of a selected sample of non-uniformSiOxCyHz thin films using phase-modulated ellipsometry.
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