Abstract
The paper presents methodology of vapour pressure measurement of metal organic precursors, describes two static apparatuses for vapour pressure measurement that have recently been constructed in the authors’ laboratory, discusses handling and preparation of metal organic precursors prior to vapour pressure measurement by a static method and briefly presents the method of simultaneous treatment of vapour pressure and thermal data. New vapour pressure data of triethylantimony [CAS RN: 617-85-6] in the temperature range from 238 K to 309 K are reported. Parameters of the Antoine and of the Cox equations for trimethylgallium [CAS RN: 1445-79-0] and trimethylaluminium [CAS RN: 75-24-1] are reported that were derived from the most reliable vapour pressure data and the related thermal data using simultaneous multi-property correlation.
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