Abstract
Mixed oxide films of transition metals gain considerable much attention due to their interesting optoelectronic properties. The low temperature chemical vapor growth processing of thin films of mixed W and Mo oxides is presented. The investigation is related to optimization of films structure and the related optoelectronic properties in dependence on the chemical vapor deposition (CVD) process parameters. Their electrochromic behavior and photoelectrode properties were studied.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
