Vapor Deposition of p‐Hexadecylstyrene by Ion‐ and Electron‐Assisted Methods

Abstract

Thin films of p‐hexadecylstyrene (C16Sty) are prepared by an ion‐assisted deposition (IAD) and an electron‐assisted deposition (EAD) methods. The IAD enhances polymerization of C16Sty molecules by irradiating argon ions on the substrate surface, while the EAD initiates radical polymerization by irradiating electrons to the C16Sty vapor. The polymerization by these methods renders the films to be amorphous, whereas the conventional vapor deposition produces polycrystalline films consisting of C16Sty monomers. Upon thermal stress, the amorphous polymer films by IAD and EAD undergo morphological change at temperatures lower than that observed for the vapor‐deposited polycrystalline film. However, the polymer films retain smooth structure without coagulation upon heating. The deposited films have surface energy lower than that of polyethylene. Especially, the films deposited by EAD have a surface energy comparable to that of a normal alkane. The IAD and EAD of C16Sty are promising methods for preparing inert surfaces by dry processes.