Abstract
Recently, polycrystalline silicon (p-Si) has been demonstrated to be an efficient anode for organic light-emitting diode (OLED) [X. L. Zhu, J. X. Sun, H. J. Peng, Z. G. Meng, M. Wong, and H. S. Kwok, Appl. Phys. Lett. 87, 083504 (2005)]. In this letter, we show that, by depositing an ultrathin vanadium pentoxide (V2O5) layer on the p-Si anode, the performance of the OLED can be greatly improved. Detailed x-ray photoelectron spectroscopy study shows that strong band bending occurs at the p-Si∕V2O5 interface, leading to much stronger hole injection. This modified p-Si anode can be integrated with the active p-Si layer of thin-film transistors in active-matrix OLED displays.
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