Abstract
AbstractBandgap engineering and quantum confinement in semiconductor heterostructures provide the means to fine‐tune material response to electromagnetic fields and light in a wide range of the spectrum. Nonetheless, forming semiconductor heterostructures on lattice‐mismatched substrates is a challenge for several decades, leading to restrictions for device integration and the lack of efficient devices in important wavelength bands. Here, it is shown that the van der Waals epitaxy of 2D GaSe and InSe heterostructures occur on substrates with substantially different lattice parameters, namely silicon and sapphire. The GaSe/InSe heteroepitaxy is applied in the growth of quantum wells and superlattices presenting photoluminescence and absorption related to interband transitions.
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