Abstract

Highly orientated V2O5 thin films were prepared by sol–gel method on SiO2/Si substrate. The thin films of V2O5 were found converting to VO2 thin films under a temperature above 400°C and a pressure below 2Pa in air. It was observed that the reduction process follows the sequence as V2O5→V3O7→V4O9→V6O13→VO2, namely from VnO2n+1 (n=2–4,6) to VO2. Annealing the V2O5 thin film at 480°C, under 1–2Pa for 20min, the VO2 polycrystalline thin film with the resistivity change larger than 3 orders through the transition temperature was obtained. The transition temperature was influenced by the heating condition in vacuum.

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